ANL MM 系列 多模 (MM) 高能量调 Q Nd:YAG 激光器 Download datasheet High energy nanosecond lasers Up to 10 J pulse energies 5 ns pulse duration 10 or 20 Hz pulse repetition rate Better than 0.5% RMS pulse energy stability
Features & Applications
FEATURES High energy nanosecond lasers Up to 10 J pulse energies 5 ns pulse duration Up to 20 ns pulse duration options available 10 or 20 Hz pulse repetition rate Better than 0.5% RMS pulse energy stability Up to 90 M² version available High efficiency pump chambers and advanced beam shaping for maximum pulse energy extraction Relay imaging between amplifier stages for smooth beam profile at the laser output Thermally induced birefringence compensated Optional temperature stabilized second, third, fourth and fifth harmonic generators Low jitter internal/external synchronization Robust and stable laser head Control through keypad, USB and LAN interfaces with supplied Windows control software (RS232 as optional)
APPLICATIONS OPO, Ti: Sapphire, dye laser pumping Material processing Plasma generation and diagnostics Nonlinear spectroscopy Remote sensing
Description
High energy ANL MM series lasers are designed to produce high energy nanosecond pulses at 1064 nm. High pulse energy, excellent pulse-to-pulse energy stability, superior beam quality makes these systems well suited for applications like OPO or Ti: Sapphire pumping, material processing and plasma diagnostics and others. ANL MM series Q-switched oscillators are designed as extremely reliable and stable nanosecond seeding sources producing hundreds mJ pulses from a compact sized body. Simple access to critical compartments of the oscillator allows for easy maintenance. The higher M² version uses a pro-longed oscillator design that allows a much higher number of modes to oscillate which results in M² value up to 90. In this case the beam profile becomes very homogenous and flat which can be useful in a number of applications. ANL series linear amplifiers are cost effective solution for high energy nanosecond systems. Advanced beam shaping ensures smooth, without hot spots beam spatial profile at the laser output. Low light depolarization level allows high efficiency generation of up to 4th harmonic with optional build-in harmonic generators. The simple and field proven design ensures easy maintenance and reliable long-term operation of the ANL MM series laser.
Angle-tuned non-linear crystals harmonic generators mounted in temperature stabilized heaters are used for second, third and fourth harmonic generation. Harmonic separation system is designed to ensure high spectral purity of radiation and direct it to the output ports. Harmonic generators can be integrated into laser head or placed outside laser head into auxiliary harmonic generator module. Output wavelength switching is done manually. Motorized wavelength switching is available by request. Triggering of the laser is possible from built-in internal or external pulse generator. Pulses with TTL levels are required for external triggering. Laser pulses have less than 0.5 ns RMS jitter with respect to Q-switch triggering pulse in both cases. System control is available through control pad, USB and LAN interfaces (RS232 as optional). The system can be controlled from personal computer with supplied software for Windows operating system.
Specifications
Model ANL3k10 ANL5k10 ANL7k10 ANL10k10 MAIN SPECIFICATIONS 1) Output energy at 1064 nm 3000 mJ 5000 mJ 7000 mJ 10000 mJ at 532 nm 2) 3) 1500 mJ 2500 mJ 3500 mJ 5000 mJ at 355 nm 2) 1000 mJ 1300 mJ 1700 mJ 2000 mJ at 266 nm 2) 270 mJ 400 mJ 500 mJ 700 mJ Pulse repetition rate 10 Hz Pulse duration 4) 5 ± 1 ns Pulse energy stability 5) at 1064 nm ≤ 0.5 % at 532 nm ≤ 1 % at 355 nm ≤ 2 % at 266 nm ≤ 3 % Long-term power drift 6) ± 2 % Beam spatial profile 7) Super-Gaussian M² 8) ~5 Beam diameter 9) ~18 mm ~25 mm Beam pointing stability 10) ≤ 50 µrad Beam divergence ≤ 0.5 mrad Optical pulse jitter 11) ≤ 0.5 ns Linewidth ≤ 1 cm-1 Polarization Linear PHYSICAL CHARACTERISTICS 12) Laser head size (W×L×H mm) 460 × 1250 × 260 460 × 1500 × 260 600 × 1800 × 300 Power supply size (W×L×H mm) 550 × 600 × 1250 550 × 600 × 1640 Umbilical length 13) 5 m OPERATING REQUIREMENTS 14) Power requirements 15) 208, 380 or 400 V AC, three phase, 50/60 Hz Power consumption 16) ≤ 5 kVA ≤ 6 kVA ≤ 7 kVA ≤ 8 kVA Water supply 16) < 5 l/min, 2 Bar, max 15 °C < 12 l/min, 2 Bar, max 15 °C Operating ambient temperature 22 ± 2 °C Storage ambient temperature 15 – 35 °C Relative humidity (non-condensing) ≤ 80 % Cleanness of the room ISO Class 7

1. Due to continuous improvement, all specifications are subject to change without notice. The parameters marked ‘typical’ are indications of typical performance and will vary with each unit we manufacture. Presented parameters can be customized to meet customer‘s requirements. All parameters measured at 1064 nm if not stated otherwise.
2. Harmonic outputs are optional. Specifications valid with respective harmonic module purchased. Outputs are not simultaneous.
3. Second harmonic is available with LBO crystal then the conversion efficiency is increased to 70%. If TH/FH options are orders second harmonic efficiency is reduced to ~50 %.
4. Standard pulse duration is 5 ns. Other pulse durations can be ordered within range of 10 – 20 s. Output energy might differ depending on duration.
5. Under stable environmental conditions, normalized to average pulse energy (RMS, averaged from 60 s).
6. Measured over 8 hours period after 30 min warm-up when ambient temperature variation is less than ±2 °C.
7. Super-Gaussian spatial mode of 6-11th order in near field.
8. M² value of ~5 is standard. Versions with M² in the range of 20 – 90 can be ordered.
9. Beam diameter is measured at signal output at 1/e² level for Gaussian beams and FWHM level for Super-Gaussian beams.
10. Beam pointing stability is evaluated as movement of the beam centroid in the focal plane of a focusing element (RMS, averaged from 60 s).
11. Optical pulse jitter with respect to electrical outputs: Trig out > 3.5 V @ 50 Ω.
12. System sizes are preliminary and depend on customer lab layout and additional options purchased.
13. Longer umbilical with up to 10 m available upon request.
14. The laser and auxiliary units must be settled in such a place void of dust and aerosols. It is advisable to operate the laser in air conditioned room, provided that the laser is placed at a distance from air conditioning outlets. The laser should be positioned on a solid worktable. Access from one side should be ensured.
15. Voltage fluctuations allowed are +10 % / -15 % from nominal value.
16. Power consumption and water supply requirements deviate depending on system configuration.

Note: Laser must be connected to the mains electricity all the time. If there will be no mains electricity for longer that 1 hour then laser (system) needs warm up for a few hours before switching on.

Options

Option Description Comment - G Provides a Gaussian-like beam profile Pulse energies are typically lower in comparison to standard version by 80 % - M20…90 Provides a flat, smooth beam profile, without hot spots and diffraction rings in the near and medium field M² > 20 or M² > 90 - RLI Optional Relay Imaging for smooth beam profile - AW Water-air cooling option Replaces or supplements Water-to-Water cooling unit. Heat dissipation equals total power consumption - N10…N20 10 – 20 ns pulse duration

Performance

Principal optical layout of ANL10k10-SH (actual layout might vary)	Typical long-term energy stability of High Energy ANL system	Typical beam profile of ANL MM laser system at 1064 nm (imaged from amplifier exit)
Typical beam profile of ANL MM laser system at 532 nm (imaged from SH crystal)	Typical beam profile of high M2 version of ANL MM laser system at 532 nm (imaged from SH crystal)
Drawings & Images
Typical external view of ANL10k10-MM laser system (actual design might vary)	ANL7k10 or ANL10k10 laser head outline drawing (actual dimensions might vary)	ANL3k10 or ANL5k10 laser head outline drawing (actual dimensions might vary)
Typical power supply rack dimensions (MR rack used depends on the laser model)

Power Supply

Cabinet Usable height Height H, mm Width W, mm Depth D, mm MR-9 9 U 455.5 (519 1) ) 553 600 MR-12 12 U 589 (653 1) ) 553 600 MR-16 16 U 768 (832 1) ) 553 600 MR-20 20 U 889 (952 1) ) 553 600 MR-25 25 U 1167 (1231 1) ) 553 600 MR-34 34 U 1640 (1709 1) ) 553 600

Full height with wheels.

Found total :

5 articles, 5 selected

Application selected :

All Applications

Search :

Conversion efficiency of a laser-plasma source based on a Xe jet in the vicinity of a wavelength of 11 nm

Related applications: High Intensity Sources

XUV generation from the interaction of pico- and nanosecond laser pulses with nanostructured targets

Related applications: High Intensity Sources

Development and characterization of a laser-plasma soft X-ray source for contact microscopy

Related applications: High Intensity Sources

EUV spectra from highly charged terbium ions in optically thin and thick plasmas

Related applications: High Intensity Sources

Enhancement of Laser-Induced Breakdown Spectroscopy (LIBS) Detection Limit Using a Low-Pressure and Short-Pulse Laser-Induced Plasma Process

Related applications: Laser Spectroscopy LIBS

 

ANL MM ordering information