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 Nanopositioners for UHV (bakeable) Applications
Nearly all standard systems can be modified for vacuum applications to 10-8 Torr if baking is not necessary. Many UHV applications require custom designed solutions. With experienced UHV instrumentation specialists on staff, we can provide custom nanopositioning solutions. For design guidance see our custom page or contact our vacuum specialists.
| Product |
Description |
Axes |
Applications |
Nano-UHV50
|
Ultra High Vacuum (UHV) compatible nanopositioner with 50 µm range of motion in X and Y, can be baked at temperatures up to 100° C |
2 |
X-ray, VUV, and optical microscopy, UHV AFM, wafer testing |
| Nano-UHV100 |
Ultra High Vacuum (UHV) compatible nanopositioner with 100 µm range of motion in X and Y, can be baked at temperatures up to 100° C |
2 |
X-ray, VUV, and optical microscopy, UHV AFM, wafer testing |
| Nano-UHV200 |
Ultra High Vacuum (UHV) compatible sub-nanometer precision scanner with 200 µm range of motion in X, Y and Z, can be baked at temperatures up to 100° C. |
3 |
X-ray, VUV, and optical microscopy, UHV AFM, wafer testing | | |
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